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多弧离子镀与磁控溅射联用镀制TiN/SiO2复合装饰薄膜的研究
Alternative TitleStudy of TiN/SiO2 composite films prepared by the combined method of multi-arc ion plating and magnetron sputtering
朱元义; 邓佩珊; 朱常锋; 朱文; 史继富4
2015
Source Publication真空
Issue1Pages:45-47
AbstractIn this paper,we combined the advantages of the two methods which are multi-arc ion plating and magnetron sputtering to prepare TiN/SiO2 composite films. The SEM results show that the TiN/SiO2 composite film is more compact and smooth than the TiN film, a
Other Abstract本文结合多弧离子镀和磁控溅射两种镀膜方法的优点,制备了Ti N/Si O2复合薄膜。通过扫描电镜可以观察到,制备的复合膜比单纯的氮化钛薄膜更加致密和光滑,基本消除了大颗粒的影响。另外,可以通过控制溅射Si O2的时间实现对膜层色度的控制。在本文的试验条件下,当氧化硅溅射时间为30 min时,得到的膜层为咖啡色,当氧化硅溅射时间为1 h,膜层为玫瑰红色。采用两种镀膜手段联用的方法,可以得到高品质,颜色丰富的膜系。
Keyword多弧离子镀 磁控溅射 氮化钛 氧化硅
Funding Organization省部产学研结合项目(20108090400109);广东省中国科学院全面战略合作项目(20118090300044);肇庆特色产业项目(磁控溅射与离子镀联用大型连续式镀膜技术的研发)
Document Type期刊论文
Identifierhttp://ir.giec.ac.cn/handle/344007/16260
Collection中国科学院广州能源研究所
太阳能系统应用实验室
Affiliation1.佛山市双石钢业有限公司,广东佛山528251
2.广州市番禺双石钛金厂,广东广州511430
3.肇庆市双石金属实业有限公司,广东肇庆526238
4.中国科学院广州能源研究所,广东广州510640
Recommended Citation
GB/T 7714
朱元义,邓佩珊,朱常锋,等. 多弧离子镀与磁控溅射联用镀制TiN/SiO2复合装饰薄膜的研究[J]. 真空,2015(1):45-47.
APA 朱元义,邓佩珊,朱常锋,朱文,&史继富.(2015).多弧离子镀与磁控溅射联用镀制TiN/SiO2复合装饰薄膜的研究.真空(1),45-47.
MLA 朱元义,et al."多弧离子镀与磁控溅射联用镀制TiN/SiO2复合装饰薄膜的研究".真空 .1(2015):45-47.
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