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多晶硅薄膜的制备与表征
胡芸菲; 沈辉; 梁宗存; 刘正义
2002-10-23
Source Publication中国第七届光伏会议论文集 ; 中国第七届光伏会议论文集 ; 中国第七届光伏会议 ; 中国第七届光伏会议
Source Publication中国第七届光伏会议论文集 ; 中国第七届光伏会议论文集 ; 中国第七届光伏会议 ; 中国第七届光伏会议
Conference Date2002-10-23
Conference Place杭州
Publication Place杭州
Funding Organization中国太阳能学会
Other Abstract以多晶硅片为衬底,在快热化学气相沉积(RTCVD)设备上,通过外延生长的方式制得多晶硅薄膜,并利用扫描电镜(SEM)、X射线衍射(XRD)等测试手段对薄膜的形貌结构及成分进行分析.
Keyword多晶硅薄膜 化学气相沉积 颗粒硅带 外延生长 薄膜制备 形貌结构
Language中文
Document Type会议论文
Identifierhttp://ir.giec.ac.cn/handle/344007/7940
Collection中国科学院广州能源研究所
Recommended Citation
GB/T 7714
胡芸菲,沈辉,梁宗存,等. 多晶硅薄膜的制备与表征[C]. 杭州,2002.
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