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Sputter deposition and computational study of M-TiO2 (M = Nb, Ta) transparent conducting oxide films
Chen, De-ming1,2,3; Xu, Gang2; Miao, Lei2; Nakao, Setsuo1; Jin, Ping1,4
2011-11-25
发表期刊SURFACE & COATINGS TECHNOLOGY
卷号206期号:5页码:1020-1023
摘要Titanium dioxide (TiO2) of the anatase phase has recently attracted much attention as a novel transparent conducting oxide (TCO) due to its rich availability, high refractive index with low absorption in the solar spectrum. While it has been found that Nb is a dopant to obtain low resistivity (similar to 10(-4) Omega cm), other metals such as Ta. W etc., are also considered as potential effective dopants. In this paper, we carried out a parallel study on Nb- and Ta-doped TiO2 anatase films both theoretically by first principles calculation and experimentally by sputtering deposition and optical/electrical characterizations. The Nb-TiO2 films deposited on glass by co-sputtering at room temperature were amorphous, and the films crystallized into an anatase structure after vacuum-annealing, with the measured resistivity values comparative to the reported. The Ta-TiO2 films were deposited similarly, and the structure and properties were compared with the Nb-doped ones. Results showed that better performance was found in Nb-TiO2 films than that in Ta-TiO2 films. Theoretical calculations indicate that the larger lattice distortion by substitution of Ta for Ti is the dominating factor to suppress crystal growth and weaken the ability of electron mobility. (C) 2011 Published by Elsevier B.V.
文章类型Article
关键词Transparent Conducting Oxide Titanium Dioxide Nb-doped Ta-doped Co-sputtering Theoretical Calculations
WOS标题词Science & Technology ; Technology ; Physical Sciences
DOI10.1016/j.surfcoat.2011.04.007
研究领域[WOS]Materials Science ; Physics
关键词[WOS]ANATASE ; GLASS
收录类别SCI ; ISTP
语种英语
WOS类目Materials Science, Coatings & Films ; Physics, Applied
WOS记录号WOS:000297877800058
引用统计
文献类型期刊论文
条目标识符http://ir.giec.ac.cn/handle/344007/10389
专题中国科学院广州能源研究所
作者单位1.Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan
2.Chinese Acad Sci, Guangzhou Inst Energy Convers, Key Lab Renewable Energy & Gas Hydrate, Guangzhou 510640, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
4.Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
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Chen, De-ming,Xu, Gang,Miao, Lei,et al. Sputter deposition and computational study of M-TiO2 (M = Nb, Ta) transparent conducting oxide films[J]. SURFACE & COATINGS TECHNOLOGY,2011,206(5):1020-1023.
APA Chen, De-ming,Xu, Gang,Miao, Lei,Nakao, Setsuo,&Jin, Ping.(2011).Sputter deposition and computational study of M-TiO2 (M = Nb, Ta) transparent conducting oxide films.SURFACE & COATINGS TECHNOLOGY,206(5),1020-1023.
MLA Chen, De-ming,et al."Sputter deposition and computational study of M-TiO2 (M = Nb, Ta) transparent conducting oxide films".SURFACE & COATINGS TECHNOLOGY 206.5(2011):1020-1023.
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