GIEC OpenIR  > 中国科学院广州能源研究所
Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films
Xiao, Xiudi1,2; Miao, Lei1; Zhang, Ming1; Xu, Gang1; Shao, Jianda2; Fan, Zhengxiu2
2013-02-01
发表期刊JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷号13期号:2页码:824-828
摘要The residual stress and laser-induced damage threshold (LIDT) of TiO2 sculptured thin films prepared by glancing angle electron beam evaporation were studied. UV-Vis-NIR spectra and optical interferometer were employed to characterize the optical and mechanical properties, respectively. Optical microscopy and Raman spectra were used to observe damage morphology and analyze damage microstructure, respectively. It was found that the residual stress changed from compressive into tensile with increasing deposition angle. The LIDT was anisotropic with p- and s-polarization light, which was due to the anisotropic nanostructure and optical properties. Simultaneously, an optimum deposition angle for the maximum threshold of TiO2 film was about 60 degrees. The mechanism of laser-induced damage was thermal in nature. The process of thermal damage with crystallization is proved by Raman spectra.
文章类型Article
关键词Tio2 Thin Films Residual Stress Anisotropic Laser-induced Damage Raman Spectra
WOS标题词Science & Technology ; Physical Sciences ; Technology
DOI10.1166/jnn.2013.5961
研究领域[WOS]Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
关键词[WOS]GLANCING ANGLE DEPOSITION ; OPTICAL-PROPERTIES ; COATINGS ; MICROSTRUCTURE ; SILICON
收录类别SCI
语种英语
WOS类目Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号WOS:000318254500019
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.giec.ac.cn/handle/344007/10044
专题中国科学院广州能源研究所
作者单位1.Chinese Acad Sci, Guangzhou Inst Energy Convers, Key Lab Renewable Energy & Gas Hydrates, Guangzhou 510640, Guangdong, Peoples R China
2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
推荐引用方式
GB/T 7714
Xiao, Xiudi,Miao, Lei,Zhang, Ming,et al. Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,2013,13(2):824-828.
APA Xiao, Xiudi,Miao, Lei,Zhang, Ming,Xu, Gang,Shao, Jianda,&Fan, Zhengxiu.(2013).Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,13(2),824-828.
MLA Xiao, Xiudi,et al."Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films".JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 13.2(2013):824-828.
条目包含的文件
条目无相关文件。
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Xiao, Xiudi]的文章
[Miao, Lei]的文章
[Zhang, Ming]的文章
百度学术
百度学术中相似的文章
[Xiao, Xiudi]的文章
[Miao, Lei]的文章
[Zhang, Ming]的文章
必应学术
必应学术中相似的文章
[Xiao, Xiudi]的文章
[Miao, Lei]的文章
[Zhang, Ming]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。