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Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films
Xiao, Xiudi1,2; Miao, Lei1; Zhang, Ming1; Xu, Gang1; Shao, Jianda2; Fan, Zhengxiu2
2013-02-01
Source PublicationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume13Issue:2Pages:824-828
AbstractThe residual stress and laser-induced damage threshold (LIDT) of TiO2 sculptured thin films prepared by glancing angle electron beam evaporation were studied. UV-Vis-NIR spectra and optical interferometer were employed to characterize the optical and mechanical properties, respectively. Optical microscopy and Raman spectra were used to observe damage morphology and analyze damage microstructure, respectively. It was found that the residual stress changed from compressive into tensile with increasing deposition angle. The LIDT was anisotropic with p- and s-polarization light, which was due to the anisotropic nanostructure and optical properties. Simultaneously, an optimum deposition angle for the maximum threshold of TiO2 film was about 60 degrees. The mechanism of laser-induced damage was thermal in nature. The process of thermal damage with crystallization is proved by Raman spectra.
SubtypeArticle
KeywordTio2 Thin Films Residual Stress Anisotropic Laser-induced Damage Raman Spectra
WOS HeadingsScience & Technology ; Physical Sciences ; Technology
DOI10.1166/jnn.2013.5961
WOS Subject ExtendedChemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS KeywordGLANCING ANGLE DEPOSITION ; OPTICAL-PROPERTIES ; COATINGS ; MICROSTRUCTURE ; SILICON
Indexed BySCI
Language英语
WOS SubjectChemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS IDWOS:000318254500019
Citation statistics
Document Type期刊论文
Identifierhttp://ir.giec.ac.cn/handle/344007/10044
Collection中国科学院广州能源研究所
Affiliation1.Chinese Acad Sci, Guangzhou Inst Energy Convers, Key Lab Renewable Energy & Gas Hydrates, Guangzhou 510640, Guangdong, Peoples R China
2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
Recommended Citation
GB/T 7714
Xiao, Xiudi,Miao, Lei,Zhang, Ming,et al. Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,2013,13(2):824-828.
APA Xiao, Xiudi,Miao, Lei,Zhang, Ming,Xu, Gang,Shao, Jianda,&Fan, Zhengxiu.(2013).Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,13(2),824-828.
MLA Xiao, Xiudi,et al."Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films".JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 13.2(2013):824-828.
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